Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon

标题
Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon
作者
关键词
-
出版物
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 85, Issue 6, Pages 063506
出版商
AIP Publishing
发表日期
2014-06-23
DOI
10.1063/1.4875982

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