C60-containing polymers for electron beam lithography

Title
C60-containing polymers for electron beam lithography
Authors
Keywords
Electron beam lithography, C<sub>60</sub>, Poly(<em class=EmphasisTypeItalic >p</em>-chloromethylstyrene)
Journal
POLYMER BULLETIN
Volume 71, Issue 9, Pages 2395-2405
Publisher
Springer Nature
Online
2014-06-24
DOI
10.1007/s00289-014-1197-z

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