A high resolution water soluble fullerene molecular resist for electron beam lithography

Published 2008 View Full Article

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Title
A high resolution water soluble fullerene molecular resist for electron beam lithography
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 19, Issue 27, Pages 275308
Publisher
IOP Publishing
Online
2008-05-28
DOI
10.1088/0957-4484/19/27/275308

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