Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS

Published 2012 View Full Article

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Title
Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS
Authors
Keywords
-
Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 209, Issue 4, Pages 679-682
Publisher
Wiley
Online
2012-03-23
DOI
10.1002/pssa.201100669
References
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