AFM and Raman studies of topological insulator materials subject to argon plasma etching

Title
AFM and Raman studies of topological insulator materials subject to argon plasma etching
Authors
Keywords
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Journal
PHILOSOPHICAL MAGAZINE
Volume 93, Issue 6, Pages 681-689
Publisher
Informa UK Limited
Online
2012-09-27
DOI
10.1080/14786435.2012.728009

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