Article
Materials Science, Multidisciplinary
Young Hyun Jo, Cheongbin Cheon, Heesung Park, Hae June Lee
Summary: Improving target erosion uniformity in a DC magnetron sputtering system is crucial for process management and enhancing the properties of the deposited film. Nonuniform target erosion is a concern when there is a magnetic flux density gradient. Two-dimensional and three-dimensional particle-in-cell simulations were conducted to investigate the relationship between magnetic fields and the target erosion profile. The simulations revealed the correlation between heating mechanisms, spatial density profiles, and plasma characteristics under various magnet conditions.
Article
Chemistry, Physical
Jie Li, Qiaoru An, Haisheng Fang
Summary: In this study, a particle transport model based on MC simulation in COMSOL was proposed to analyze the effects of working conditions and geometry parameters on deposition uniformity in magnetron sputtering. It was found that increasing pressure and decreasing temperature can improve deposition uniformity. The influence of geometry parameters on deposition efficiency and uniformity was also investigated, and it was found that the closer the zone with high particle deposition is to the substrate center, the higher the deposition efficiency, while the greater the particle concentration difference on the substrate, the lower the deposition uniformity. Moreover, optimized parameters were determined to maximize both the deposition efficiency and uniformity.
APPLIED SURFACE SCIENCE
(2024)
Article
Physics, Applied
Suihan Cui, Qiuhao Chen, Yuxiang Guo, Lei Chen, Zheng Jin, Xiteng Li, Chao Yang, Zhongcan Wu, Xiongyu Su, Zhengyong Ma, Ricky K. Y. Fu, Xiubo Tian, Paul K. Chu, Zhongzhen Wu
Summary: This study combines the cellular automata method and particle-in-cell/Monte Carlo collision method to establish an accurate dynamic model for high-power and high-ionization discharges, considering all the interactions related to etching morphology, plasma density, electric field, and magnetic field. Compared to traditional models, the dynamic etching model shows smaller errors in morphology simulation in continuous high-power magnetron sputtering, providing more accurate results.
JOURNAL OF PHYSICS D-APPLIED PHYSICS
(2022)
Article
Materials Science, Ceramics
Min Zhang, Xun Zhou, Xu Wang, Chaoyong Deng
Summary: BaTiO3 (BTO) and NiFe composite films were grown on different substrates using magnetron sputtering. The films were characterized by XRD, ferroelectric analyzer, and other techniques, showing good surface quality and magnetoelectric coupling properties according to experimental and simulation results.
CERAMICS INTERNATIONAL
(2021)
Article
Computer Science, Information Systems
Wenlong Li, Hailong Li, Yong Yin, Minsheng Song, Bin Wang, Liangjie Bi, Lin Meng
Summary: This study developed a novel high-efficiency 12-vanes CW magnetron and anode resonance system that improved mode separation, expanded the working space of pi-mode and made other modes more challenging to trigger, ultimately eliminating the possibility of mode jumping. The work efficiency of the 12-vanes CW magnetron was significantly enhanced.
Article
Materials Science, Multidisciplinary
Wei Xu, Xin Mao, Nan Zhou, Qing-Yu Zhang, Bo Peng, Yu Shen
Summary: The study investigated the plasma near the sputtering target using optical emission spectroscopy and found that the atomic oxygen density ([O]) plays a crucial role in the growth behavior and crystallinity of NiO films. By adjusting the sputtering mode and [O] value, it is possible to influence the orientation growth and crystallinity of NiO films.
Article
Nanoscience & Nanotechnology
Changfang Li, Baolin Zhang, Zhaozhu Qu, Hongbin Zhao, Qixin Li, Zhaohui Zeng, Rusen Yang
Summary: Pt/CeOx/Pt devices prepared by magnetron sputtering exhibit rectification in current-voltage curves, with CeOx film showing inhomogeneous composition and increased oxygen vacancies near the top electrode. The presence of charged oxygen vacancies in CeOx near the top electrode, combined with the Schottky conduction mechanism, explains the asymmetrical resistance change in the devices, highlighting the importance of compositional inhomogeneity in sputtering of oxide targets for device variability.
Article
Chemistry, Physical
Rafal Chodun, Marlena Dypa, Bartosz Wicher, Katarzyna Nowakowska - Langier, Sebastian Okrasa, Roman Minikayev, Krzysztof Zdunek
Summary: This study investigated a Gas Injection Magnetron Sputtering technique for target temperature control by using various frequencies of plasma pulse generation to limit heat dissipation. The results showed that target temperature did not affect the chemical and phase composition of coatings, but the thickness of fabricated coatings increased in hot sputtering processes.
APPLIED SURFACE SCIENCE
(2022)
Article
Physics, Fluids & Plasmas
Baohong Guo, Ute Ebert, Jannis Teunissen
Summary: We investigate the propagation of negative and positive streamers in C4F7N-CO2 mixtures and find that they are influenced by the background field and require short conductive channels and a source of free electrons ahead of them. Our simulations also show that a stochastic background ionization process has an interesting effect on the formation of negative streamers, allowing for a chain of negative streamers to form.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2023)
Article
Physics, Fluids & Plasmas
Swetha Suresh Babu, Martin Rudolph, Daniel Lundin, Tetsuhide Shimizu, Joel Fischer, Michael A. Raadu, Nils Brenning, Jon Tomas Gudmundsson
Summary: The ionization region model (IRM) was used to simulate a high power impulse magnetron sputtering discharge with a tungsten target. The study found that the initial peak in the discharge current was caused by argon ions bombarding the cathode target, after which W+ ions became the dominant ions and contributed to the total discharge current. Additionally, the findings were in good agreement with experimentally determined deposition rates.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2022)
Article
Chemistry, Multidisciplinary
Daniel Brito, Pedro Anacleto, Ana Perez-Rodriguez, Jose Fonseca, Pedro Santos, Marina Alves, Alessandro Cavalli, Deepanjan Sharma, Marcel S. S. Claro, Nicoleta Nicoara, Sascha Sadewasser
Summary: This study proposed and examined the fabrication of Sb2Se3 thin-film solar cells using pulsed hybrid reactive magnetron sputtering. The influence of growth temperature and Se pulse period on morphology, crystal structure, and composition was investigated. The solar cell performance was assessed through current-voltage characteristics, achieving a power conversion efficiency of 3.7% for a Sb2Se3 solar cell with 900 nm thickness, deposited at 270°C and using Se pulses with 0.1 s duration and 0.5 s period.
Article
Materials Science, Ceramics
Chen Wang, Wei-Hang Fan, Yu-Chao Zhang, Pin-Chun Kang, Wan-Yu Wu, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu
Summary: This study investigated the properties of Sn-doped Ga2O3 films deposited on sapphire substrates through RF magnetron sputtering at different oxygen flow ratios. In situ optical emission spectroscopy was used to monitor the plasma radicals generated during the deposition process. The films showed amorphous structures with nanoparticles and a decreased deposition rate with increasing oxygen flow ratio. The conductive mechanism of the films was attributed to the ratio of substitutional Sn atoms and the SnO2 phase. Metal-semiconductor-metal solar-blind photodetectors were developed and analyzed to demonstrate the effect of oxygen flow ratio.
CERAMICS INTERNATIONAL
(2023)
Review
Materials Science, Multidisciplinary
D. Depla
Summary: This paper discusses the impact of negative oxygen ions on film properties during reactive sputtering. Despite numerous studies on the subject, quantification is often lacking due to limited knowledge of negative ion yield for various oxides. The compilation of multiple literature sources provides a quantitative framework for the discussed trends.
CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES
(2023)
Article
Physics, Fluids & Plasmas
S. Thiemann-Monje, J. Held, S. Schuettler, A. von Keudell, V Schulz-von der Gathen
Summary: In magnetron sputtering discharges, ions and neutral particles exhibit high velocities in the azimuthal direction. The ion velocities increase with target distance. Experimental results are in good agreement with simulations, indicating that the momentum transfer from electrons to ions via Coulomb collisions is the main source of azimuthal acceleration.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2023)
Article
Materials Science, Coatings & Films
Jonathan L. Priedeman, Gregory B. Thompson
Summary: A piston-crank mechanism is developed for agitating powder under vacuum conditions to achieve a uniform coating. The mechanism has shown a higher coating volume per energy input compared to alternative agitation methods.
SURFACE & COATINGS TECHNOLOGY
(2022)
