Electrical characteristics of TiO2/Al2O3/InP capacitor after removal of native oxides by atomic layer deposited Al2O3 self-cleaning and (NH4)2S treatments

Published 2015 View Full Article

Authors

Keywords

Atomic layer deposition, Titanium dioxide, Aluminum oxide, Ammonium sulfide, Indium phosphide

Journal

THIN SOLID FILMS

Volume 595, Issue -, Pages 12-16

Publisher

Elsevier BV

Online

2015-10-25

DOI

10.1016/j.tsf.2015.10.036

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