Electrical characteristics of TiO2/Al2O3/InP capacitor after removal of native oxides by atomic layer deposited Al2O3 self-cleaning and (NH4)2S treatments

标题
Electrical characteristics of TiO2/Al2O3/InP capacitor after removal of native oxides by atomic layer deposited Al2O3 self-cleaning and (NH4)2S treatments
作者
关键词
Atomic layer deposition, Titanium dioxide, Aluminum oxide, Ammonium sulfide, Indium phosphide
出版物
THIN SOLID FILMS
Volume 595, Issue -, Pages 12-16
出版商
Elsevier BV
发表日期
2015-10-25
DOI
10.1016/j.tsf.2015.10.036

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