Article
Chemistry, Multidisciplinary
Geemin Kim, Sol An, Seok-Ki Hyeong, Seoung-Ki Lee, Myungwoong Kim, Naechul Shin
Summary: In this study, the combination of halide exchange process and patterning of metal halide perovskite thin films through vapor transport method was demonstrated, resulting in high-quality MAPbBr(3) pattern arrays with exceptional stability and detectivity in photodetectors. These results highlight the potential of chemical vapor deposition patterning of MHP materials in multicomponent optoelectronic device systems.
Article
Chemistry, Physical
Yuchen Du, Shiqi Yin, Ying Li, Jiawang Chen, Dongfeng Shi, Erjuan Guo, Hui Zhang, Zihan Wang, Qinggang Qin, Chongwen Zou, Tianyou Zhai, Liang Li
Summary: This study presents a simplified technique for growing high-quality GaN thin films for the assembly of a high-performance UV photodetector array using UV lithography. The technique is highly compatible with common semiconductor manufacturing techniques and allows for precise patterning modification. The detectors exhibit impressive photo-response performance, with low dark current, high I-light/I-dark ratio, high responsivity, and decent specific detectivity. The optoelectronic studies highlight the strong homogeneity and repeatability of the photodetector array, making it a reliable UV image sensor with sufficient spatial resolution. These outcomes demonstrate the enormous potential of the proposed patterning technique.
Article
Engineering, Environmental
Chenbo Yuan, Liwen Yin, Peng Du, Yu Yu, Kaifu Zhang, Xiaodi Ren, Xiaowen Zhan, Shan Gao
Summary: In this study, uniform microgroove patterns were designed on zinc foil anodes using a simple acid etching strategy, leading to more homogeneous zinc deposition, accelerated reaction kinetics, and inhibited electrolyte corrosion. The improved zinc anodes exhibited excellent stability and low overpotential.
CHEMICAL ENGINEERING JOURNAL
(2022)
Article
Chemistry, Physical
Yifei Yang, Rui Sun, Yossef A. Elabd
Summary: In this study, a new template-assisted electrospinning/electrospraying (E/E) technique was developed to fabricate organized-structured nanofiber/nanoparticle electrodes with well-defined 3D hexagonal patterned arrays of various sizes. The 80 mm diameter hexagonal patterned electrodes showed higher fuel cell power densities and electrochemical surface areas compared to random electrodes, with improved mechanical stiffness and platinum utilization. The E/E technique provides a versatile platform for investigating the effect of pattern type and size on fuel cell platinum utilization under ultra-low platinum loadings.
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
(2022)
Article
Materials Science, Ceramics
Se Jin Kim, Geonoh Choe, Tae Kyu An, Yong Jin Jeong
Summary: This study optimized photo-curable zinc acrylate (ZnA) films as ZnO precursors and successfully prepared photo-patterned ZnO semiconductors, providing a new approach to solve the patterning issues of solution-processed ZnO films.
CERAMICS INTERNATIONAL
(2021)
Article
Polymer Science
Ze-Qian Wang, Yi-Meng Wang, Xing-Yu Wang, Bing-Hua Wang, Jing-Bo Chen, Chang-Yu Shen, Bin Zhang
Summary: The nucleation and spatial distribution of single crystals have been controlled using self-nucleation of patterned dendritic crystals. This technique provides a versatile template for large-scale manufacturing of selective metal patterns for electronic devices and other applications.
CHINESE JOURNAL OF POLYMER SCIENCE
(2022)
Article
Engineering, Multidisciplinary
Jinlin Chang, Heng Zhai, Zhirun Hu, Jiashen Li
Summary: This paper provides comprehensive information on the application of metal nanocomposites in electromagnetic interference shielding. The authors analyze and study various aspects such as material selection, structural design, engineering preparation schemes, and cutting-edge techniques.
COMPOSITES PART B-ENGINEERING
(2022)
Article
Chemistry, Multidisciplinary
Xu Li, Chang Liu, Feng Ding, Zheyi Lu, Peng Gao, Ziwei Huang, Weiqi Dang, Liqiang Zhang, Xiaohui Lin, Shuimei Ding, Bailing Li, Ying Huangfu, Xiaohua Shen, Bo Li, Xuming Zou, Yuan Liu, Lei Liao, Yiliu Wang, Xidong Duan
Summary: The wafer-scale single-crystal CsPbCl3 thin films were successfully grown by vapor-phase epitaxy method, and the as-constructed photodetectors exhibited ultralow dark current, ultrahigh ON/OFF ratio, competitive responsivity, external quantum efficiency, and specific detectivity. Moreover, these photodetectors demonstrated superb long-term stability and temperature tolerances, as well as excellent UV light imaging capability.
ADVANCED FUNCTIONAL MATERIALS
(2023)
Article
Multidisciplinary Sciences
Xin Yu Zheng, Sanyum Channa, Lauren J. Riddiford, Jacob J. Wisser, Krishnamurthy Mahalingam, Cynthia T. Bowers, Michael E. McConney, Alpha T. N'Diaye, Arturas Vailionis, Egecan Cogulu, Haowen Ren, Zbigniew Galazka, Andrew D. Kent, Yuri Suzuki
Summary: This study introduces a ferromagnetic insulator spinel, Li0.5Al1.0Fe1.5O4 (LAFO), with low magnetic damping, perpendicular magnetic anisotropy, and no magnetic dead layer. By integrating these LAFO films with epitaxial Pt spin source layers, record low magnetization switching currents and high spin-orbit torque efficiencies are achieved.
NATURE COMMUNICATIONS
(2023)
Article
Materials Science, Multidisciplinary
Somayeh Azizi, Mohammad Hossein Ehsani, Amir Zareidoost
Summary: This study investigated the control of magnesium (Mg) degradation rate through the application of (Zr-Nb) thin films. The findings showed that the Zr-2.5Nb coating with a thickness of 650 nm exhibited the highest corrosion resistance and increased the hardness to reduced Young's modulus ratio, making it suitable for the development of orthopedic implants.
MATERIALS CHARACTERIZATION
(2022)
Article
Materials Science, Multidisciplinary
C. de Melo, C. Guillemard, A. M. Friedel, V Palin, J. C. Rojas-Sanchez, S. Petit-Watelot, S. Andrieu
Summary: The study focused on the transport properties of Co2MnSi thin films, revealing the unique electronic band structure and temperature-dependent scattering processes, which provide important insights for utilizing this material in magnetoelectric devices.
APPLIED MATERIALS TODAY
(2021)
Article
Materials Science, Multidisciplinary
Ramasis Goswami, Syed Qadri, Neeraj Nepal, Charles Eddy
Summary: In this study, ultra-thin AlN films were grown on different substrates using atomic layer epitaxy, showing that the substrate, particularly the strain, plays a crucial role in determining the crystal structure of AlN films. The strain level varied significantly depending on the substrate, impacting the orientation relation and crystal quality of AlN films.
Article
Chemistry, Multidisciplinary
Seong Won Kim, Sangsik Park, Siyoung Lee, Daegun Kim, Giwon Lee, Jonghyun Son, Kilwon Cho
Summary: Researchers have successfully developed a stretchable high-performance organic semiconductor thin film by patterning and pinning a polymer semiconductor solution on an elastomeric substrate. This thin film exhibits superior stretchability and charge transport performance, making it suitable for applications in soft electronics.
ADVANCED FUNCTIONAL MATERIALS
(2021)
Review
Crystallography
Vladimir Chigrinov, Aleksey Kudreyko, Qi Guo
Summary: The use of azo dye molecules for photoalignment of liquid crystals has become a common alternative to traditional rubbing alignment methods. Photoalignment mechanisms involve rotational diffusion of azo dye molecules exposed to ultraviolet polarized light, resulting in intensity-dependent changes in liquid crystal anchoring. Recent applications include q-plates, optically rewritable e-paper, and Dammann gratings, featuring azo dye aligned nematic and ferroelectric liquid crystals. Theoretical aspects and simulations of the alignment process and displays are also discussed.
Article
Materials Science, Multidisciplinary
Niklas Wolff, Philipp Jordt, Justin Jetter, Henning Vogt, Andriy Lotnyk, Klaus Seemann, Sven Ulrich, Eckhard Quandt, Bridget M. Murphy, Lorenz Kienle
Summary: Composites of ultra-thin nanolayers of FeCo/TiN exhibit stability at high temperatures and defined magnetic properties that can be tuned by adjusting layer thickness. Using aberration-corrected microscopes and X-ray diffraction analysis, the nanostructure was found to consist of individual layers of FeCo and TiN forming a superlattice with a specific orientation relationship. Simulation of electron diffraction patterns confirmed a defined orientation relationship leading to the stabilization of tetragonal FeCo unit cells at the nanoscale.
MATERIALS CHARACTERIZATION
(2021)
Article
Engineering, Electrical & Electronic
Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
(2019)
Article
Engineering, Electrical & Electronic
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
(2020)
Proceedings Paper
Optics
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Qais Saadeh, Victor Soltwisch, Simon Bihr, Joerg Zimmermann, Vicky Philipsen
Summary: State-of-the-art EUV exposure systems utilize EUV radiation with a wavelength around 13.52 nm, affecting image blur and non-telecentricity due to variations in wavelength within the range of 13.2 nm to 13.8 nm. Material dispersion on EUV mirrors and 3D masks introduces additional sensitivity to exposure wavelength, quantified using simulation models and optical material data.
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2021
(2021)
Proceedings Paper
Engineering, Electrical & Electronic
Pankaj Bhardwaj, Andreas Erdmann, Robert Leitel
Summary: This paper discusses a collaborative effort between two Fraunhofer institutes to develop a lithography model for simulating the fabrication of blazed gratings using grayscale lithography. The model is calibrated with experimental data, and an inbuilt optimizer is used to identify the most appropriate model parameters.
COMPUTATIONAL OPTICS 2021
(2021)
Proceedings Paper
Engineering, Electrical & Electronic
L. Bilalaj, H. Mesilhy, A. Erdmann
Summary: Polarization was observed to have an impact on high NA lithography in extreme ultraviolet imaging simulations. The study found that polarized illumination can improve local contrast in images. Through a multiobjective optimization algorithm, the most suitable multilayer configurations were identified to maximize reflectivity of TE polarized light and fraction of polarization.
COMPUTATIONAL OPTICS 2021
(2021)
Article
Engineering, Electrical & Electronic
Abdalaziz Awad, Philipp Brendel, Peter Evanschitzky, Dereje S. Woldeamanual, Andreas Rosskopf, Andreas Erdmann
Summary: The study aims to accurately model EUV lithographic imaging using deep learning, taking into account 3D mask effects and EUV process variations to surpass the computational bottleneck posed by EMF simulations.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Article
Engineering, Electrical & Electronic
Peter Evanschitzky, Nicole Auth, Tilmann Heil, Christian Felix Hermanns, Andreas Erdmann
Summary: This study demonstrates the successful application of deep learning-based methods in mask repair, utilizing a hybrid and modular approach combining multiple deep learning networks and analytical methods. The system showed excellent functionality and defect detection accuracy in real SEM images.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Article
Engineering, Electrical & Electronic
Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Claire van Lare, Eelco van Setten, Andreas Erdmann
Summary: By viewing EUV mask absorber openings as waveguides, this perspective can explain imaging phenomena that cannot be explained by traditional methods. Emphasizing the importance of low refractive index and high extinction materials in EUV lithography, this perspective challenges our traditional understanding of how attenuated phase shift masks behave in EUV.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Article
Engineering, Electrical & Electronic
Meiyi Wu, Devesh Thakare, Jean-Francois De Marneffe, Patrick Jaenen, Laurent Souriau, Karl Opsomer, Jean-Philippe Soulie, Andreas Erdmann, Hazem Mesilhy, Philipp Naujok, Markus Foltin, Victor Soltwisch, Qais Saadeh, Vicky Philipsen
Summary: Novel mask absorber designs, including materials such as TaTeN, Ru-Ta, and Pt-Mo alloys, are being explored in the EUVL community for their ability to mitigate mask 3D effects. The choice of materials is based on theoretical performance evaluated through EUV imaging simulation. The materials are tested for their absorption, refraction, and stability in potential EUVL mask applications.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Review
Engineering, Electrical & Electronic
Zelalem Belete, Peter De Bisschop, Ulrich Welling, Andreas Erdmann
Summary: Organometallic photoresists are being explored as an alternative material to advance extreme ultraviolet lithography to the next level. Research indicates that the interaction between photoresists and developers significantly impacts the results.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Review
Engineering, Electrical & Electronic
Sean D'Silva, Thomas Muelders, Hans-Juergen Stock, Andreas Erdmann
Summary: The study explores the impact of PEB shrinkage on resist development rate and final feature dimensions. Strain concentration in the resist bulk affects stability and development rate, influencing resist feature shape and contours.
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
(2021)
Proceedings Paper
Instruments & Instrumentation
Meiyi Wu, Devesh Thakare, Jean-Francois De Marneffe, Patrick Jaenen, Laurent Souriau, Karl Opsomer, Jean-Philippe Soulie, Andreas Erdmann, Hazem Mesilhy, Philipp Naujok, Markus Foltin, Victor Soltwisch, Qais Saadeh, Vicky Philipsen
EXTREME ULTRAVIOLET LITHOGRAPHY 2020
(2020)
Proceedings Paper
Optics
H. Mesilhy, P. Evanschitzky, G. Bottiglieri, E. van Setten, T. Fliervoet, A. Erdmann
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI
(2020)
Proceedings Paper
Optics
Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Laurent Souriau, Jens Rip, Christophe Detavernier, Andreas Erdmann, Peter Evanschitzky, Christian Laubis, Philipp Hoenicke, Victor Soltwisch, Eric Hendrickx
XXVI SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY (PHOTOMASK JAPAN 2019)
(2019)
Proceedings Paper
Optics
Andreas Erdmann, Peter Evanschitzky, Gerardo Bottiglieri, Eelco van Setten, Timon Fliervoet
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY X
(2019)
