4.3 Article

900 keV gold ion sputter etching of silicon and metals

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2008.03.229

Keywords

high energy ion sputtering; ion etching; heavy ion beam lithography

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Au ions (900 keV) have been used to directly sputter etch microstructures in silicon, aluminum, copper and silver. The results presented clearly demonstrate that high energy heavy ions can be used to fabricate microstructures in selected metals and silicon in a single step process. (C) 2008 Elsevier B.V. All rights reserved.

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