Monitoring tantalum nitride thin film structure by reactive RF magnetron sputtering: Influence of processing parameters

Published 2015 View Full Article

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Title
Monitoring tantalum nitride thin film structure by reactive RF magnetron sputtering: Influence of processing parameters
Authors
Keywords
Tantalum nitride, Thin film, Reactive sputtering, Structure control, Quenching
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 284, Issue -, Pages 192-197
Publisher
Elsevier BV
Online
2015-09-08
DOI
10.1016/j.surfcoat.2015.08.075

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