Influence of bias voltage and oxygen flow rate on morphology and crystallographic properties of gas flow sputtered zirconia coatings

Published 2015 View Full Article

Authors

Keywords

Gas flow sputtering, Reactive sputtering, Yttria stabilized zirconia, Thermal barrier coatings, Substrate bias, Oxygen flow rate, Morphology, Microstructure, Grain orientation, Thermal cycling

Journal

SURFACE & COATINGS TECHNOLOGY

Volume 276, Issue -, Pages 668-676

Publisher

Elsevier BV

Online

2015-06-06

DOI

10.1016/j.surfcoat.2015.06.002

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