Silicon 45° micromirrors fabricated by etching in alkaline solutions with organic additives

Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

(2012) Krzysztof P. Rola et al.   MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

The effect of isopropyl alcohol concentration on the etching process of Si-substrates in KOH solutions

(2011) Irena Zubel et al.   SENSORS AND ACTUATORS A-PHYSICAL

Modifying of etching anisotropy of silicon substrates by surface active agents

(2011) Krzysztof Rola et al.   Open Physics

Forty-Five Degree Micromirror Fabrication Using Silicon Anisotropic Etching with Surfactant-Added Tetramethylammonium Hydroxide Solution

(2010) Hiroyuki Yagyu et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Formation of ultra-smooth 45° micromirror on (100) silicon with low concentration TMAH and surfactant: Techniques for enlarging the truly 45° portion

(2010) Yi Wei Xu et al.   SENSORS AND ACTUATORS A-PHYSICAL

Compact and passive-alignment 4-channel × 25-Gbps optical interconnect modules based on silicon optical benches with 45° micro-reflectors

(2009) Hsu-Liang Hsiao et al.   OPTICS EXPRESS