Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions

Investigation of Si(h k l) surfaces etched in KOH solutions saturated withtertiary-butyl alcohol

(2011) K P Rola et al.   JOURNAL OF MICROMECHANICS AND MICROENGINEERING

The effect of isopropyl alcohol concentration on the etching process of Si-substrates in KOH solutions

(2011) Irena Zubel et al.   SENSORS AND ACTUATORS A-PHYSICAL

Forty-Five Degree Micromirror Fabrication Using Silicon Anisotropic Etching with Surfactant-Added Tetramethylammonium Hydroxide Solution

(2010) Hiroyuki Yagyu et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Fabrication methods based on wet etching process for the realization of silicon MEMS structures with new shapes

(2010) Prem Pal et al.   MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

Formation of ultra-smooth 45° micromirror on (100) silicon with low concentration TMAH and surfactant: Techniques for enlarging the truly 45° portion

(2010) Yi Wei Xu et al.   SENSORS AND ACTUATORS A-PHYSICAL

Complex three-dimensional structures in Si{1 0 0} using wet bulk micromachining

(2009) Prem Pal et al.   JOURNAL OF MICROMECHANICS AND MICROENGINEERING

Effect of varying water content on the structure of butyl alcohol/water mixtures: FT-NIR two-dimensional correlation and chemometric studies

(2007) Mirosław A. Czarnecki et al.   JOURNAL OF MOLECULAR STRUCTURE