Journal
MICROELECTRONICS RELIABILITY
Volume 54, Issue 9-10, Pages 2196-2199Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.microrel.2014.07.031
Keywords
GaN; Schottky Barrier Diode (SBD); Pulsed I-V; Current collapse; TCAD simulation; Trapping/de-trapping
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Dynamic characterization (Pulsed I-V) on Au-free AlGaN/GaN Schottky Barrier Diodes (SBDs) has been performed to evaluate the impact of negative quiescent biases on the forward characteristics. Results show an increase of on-resistance when more negative quiescent biases are applied, and a sudden current collapse phenomenon when the quiescent bias exceeds -175 V. Furthermore, the measurements show a common signature: the total current collapse is the result of the trapping phenomena occurring around the Schottky contact corner. The trap levels of 0.5 eV and 1.0 eV have been characterized from current transient spectroscopy. A TCAD model with these two trap levels as donor states at the Si3N4/AlGaN interface has been defined, to understand their role and explain the observed behavior of AlGaN/GaN SBDs from this dynamic measurement. We propose that trapping at deep energy levels (Trap1 = 1.0 eV), existing at the Si3N4/AlGaN interface, is responsible for the gradual current reduction observed for negative quiescent biases up to Anode-to-Cathode voltage (V-AC) of -175 V. The electron filling at the shallower traps with high density at energy level located 0.5 eV starts at higher reverse biases, resulting in a strong Fermi-level pinning, which can be the cause of sudden current collapse. (C) 2014 Published by Elsevier Ltd.
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