Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses

Published 2009 View Full Article

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Title
Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses
Authors
Keywords
-
Journal
MICROELECTRONICS RELIABILITY
Volume 49, Issue 9-11, Pages 1024-1028
Publisher
Elsevier BV
Online
2009-08-07
DOI
10.1016/j.microrel.2009.06.029

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