A novel approach to characterization of progressive breakdown in high-k/metal gate stacks

Published 2008 View Full Article

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Title
A novel approach to characterization of progressive breakdown in high-k/metal gate stacks
Authors
Keywords
-
Journal
MICROELECTRONICS RELIABILITY
Volume 48, Issue 11-12, Pages 1759-1764
Publisher
Elsevier BV
Online
2008-10-03
DOI
10.1016/j.microrel.2008.07.071

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