Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries

Published 2013 View Full Article

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Title
Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 109, Issue -, Pages 129-132
Publisher
Elsevier BV
Online
2013-03-16
DOI
10.1016/j.mee.2013.03.022

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