Investigating the effect of diamond size and conditioning force on chemical mechanical planarization pad topography

Title
Investigating the effect of diamond size and conditioning force on chemical mechanical planarization pad topography
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 4, Pages 553-559
Publisher
Elsevier BV
Online
2009-08-26
DOI
10.1016/j.mee.2009.08.007

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