Characterization of sputtered tungsten nitride film and its application to Cu electroless plating

Title
Characterization of sputtered tungsten nitride film and its application to Cu electroless plating
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 2, Pages 395-400
Publisher
Elsevier BV
Online
2007-08-14
DOI
10.1016/j.mee.2007.07.017

Ask authors/readers for more resources

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started