4.6 Article

Growth of non-polar α-plane ZnO1-xSx films by pulsed laser deposition

Journal

MATERIALS LETTERS
Volume 131, Issue -, Pages 19-22

Publisher

ELSEVIER
DOI: 10.1016/j.matlet.2014.05.150

Keywords

Thin films; XPS; Structural; Semiconductors

Funding

  1. National Natural Science Foundation of China [51302244, 91333203]
  2. Zhejiang Provincial Natural Science Foundation of China [LQ13E020001]

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A series of non-polar ZnO1-xSx thin films with different S contents were grown on r-plane sapphire substrates by pulsed laser deposition. The S content in the ZnO1-xSx thin films was adjusted by changing the growth temperature. Up to 20 at% S was introduced into ZnO film without changing the single-phase hexagonal structure. Based on the X-ray diffraction analysis, the ZnO1-xSx thin films with S content below 19 at% exhibit unique non-polar < 11 (2) over bar0 > orientation, while the films with S content above 19 at% show < 0 0 0 1 > and < 11 (2) over bar0 > mixed orientations. X-ray photoelectron spectroscopy confirmed the chemical states of Zn, O and S elements in the ZnO1-xSx films. (C) 2014 Elsevier B.V. All rights reserved.

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