Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum

Published 2013 View Full Article

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Title
Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum
Authors
Keywords
-
Journal
MATERIALS CHEMISTRY AND PHYSICS
Volume 142, Issue 2-3, Pages 614-618
Publisher
Elsevier BV
Online
2013-08-24
DOI
10.1016/j.matchemphys.2013.08.004

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