Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates

出版年份 2015 全文链接

标题

作者

关键词

Chemical mechanical polishing (CMP), Silicon carbide (SiC), Silica, Ceria

出版物

APPLIED SURFACE SCIENCE

Volume 359, Issue -, Pages 664-668

出版商

Elsevier BV

发表日期

2015-10-27

DOI

10.1016/j.apsusc.2015.10.158

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