4.6 Article

Photoresponsive Surface Molecularly Imprinted Poly(ether sulfone) Microfibers

Journal

LANGMUIR
Volume 28, Issue 37, Pages 13284-13293

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/la302687d

Keywords

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Funding

  1. National Natural Science Foundation of China [50973070, 51073105, 51173119]
  2. State Education Ministry of China [20100181110031]
  3. Program for Changjiang Scholars and Innovative Research Team in University [IRT1163]

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In the present study, photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers are prepared via nitration reaction, the wet-spinning technique, surface nitro reduction reaction, and surface diazotation reaction for the selectively photoregulated uptake and release of 4-hydrobenzoic acid. The prepared molecularly imprinted microfibers show selective binding to 4-HA under irradiation at 450 nm and release under irradiation at 365 nm. The simple, convenient, effective, and productive method for the preparation of azo-containing photoresponsive material is also applied to the modification of polysulfone and poly(ether ether ketone). All three benzene-ring-containing polymers show significant photoresponsibility after the azo modification.

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