Role of Positive Ions in Determining the Deposition Rate and Film Chemistry of Continuous Wave Hexamethyl Disiloxane Plasmas

Published 2011 View Full Article

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Title
Role of Positive Ions in Determining the Deposition Rate and Film Chemistry of Continuous Wave Hexamethyl Disiloxane Plasmas
Authors
Keywords
-
Journal
LANGMUIR
Volume 27, Issue 19, Pages 11943-11950
Publisher
American Chemical Society (ACS)
Online
2011-08-25
DOI
10.1021/la202010n

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