D4H/D4VSilicone: A Replica Material with Several Advantages for Nanoimprint Lithography and Capillary Force Lithography

Published 2011 View Full Article

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Title
D4H/D4VSilicone: A Replica Material with Several Advantages for Nanoimprint Lithography and Capillary Force Lithography
Authors
Keywords
-
Journal
LANGMUIR
Volume 27, Issue 13, Pages 7976-7979
Publisher
American Chemical Society (ACS)
Online
2011-06-01
DOI
10.1021/la201141k

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