Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography

Published 2009 View Full Article

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Title
Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography
Authors
Keywords
-
Journal
LANGMUIR
Volume 25, Issue 12, Pages 6604-6606
Publisher
American Chemical Society (ACS)
Online
2009-05-22
DOI
10.1021/la900902f

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