Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

Title
Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio
Authors
Keywords
-
Journal
LAB ON A CHIP
Volume 9, Issue 14, Pages 1994
Publisher
Royal Society of Chemistry (RSC)
Online
2009-05-26
DOI
10.1039/b904769g

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