HfO[sub 2]∕Si interface formation in atomic layer deposition films: An in situ investigation

出版年份 2009 全文链接

标题

作者

关键词

出版物

Volume 27, Issue 1, Pages 300

出版商

American Vacuum Society

发表日期

2009-02-12

DOI

10.1116/1.3021023

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