TEMAZ/O3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal–insulator–metal capacitors

Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping

(2012) Wenke Weinreich et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effects of Interfacial Layer on Characteristics of TiN/ZrO2 Structures

(2011) Younsoo Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Mechanism, Products, and Growth Rate of Atomic Layer Deposition of Noble Metals

(2010) Simon D. Elliott   LANGMUIR

Thermal Chemistry of Tetrakis(ethylmethylamido)titanium on Si(100) Surfaces†

(2009) Byung-Chang Kan et al.   JOURNAL OF PHYSICAL CHEMISTRY A

Impact of interface variations on J–V and C–V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1−x)AlxO2 films

(2009) W. Weinreich et al.   MICROELECTRONIC ENGINEERING

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of ZrO2from (CpMe)2Zr(OMe)Me and Water or Ozone

(2008) Kjell Knapas et al.   CHEMISTRY OF MATERIALS

Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films

(2008) Jaakko Niinistö et al.   JOURNAL OF MATERIALS CHEMISTRY