Effect of simultaneous source and bias pulsing in inductively coupled plasma etching

Published 2009 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Effect of simultaneous source and bias pulsing in inductively coupled plasma etching
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 106, Issue 10, Pages 103305
Publisher
AIP Publishing
Online
2009-12-01
DOI
10.1063/1.3262616
References
View 2 related references

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.