Microstructure and chemical wet etching characteristics of AlN films deposited by ac reactive magnetron sputtering

Published 2009 View Full Article

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Title
Microstructure and chemical wet etching characteristics of AlN films deposited by ac reactive magnetron sputtering
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 28, Issue 1, Pages 69-76
Publisher
American Vacuum Society
Online
2009-12-04
DOI
10.1116/1.3268620

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