Microstructure and chemical wet etching characteristics of AlN films deposited by ac reactive magnetron sputtering

标题
Microstructure and chemical wet etching characteristics of AlN films deposited by ac reactive magnetron sputtering
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 28, Issue 1, Pages 69-76
出版商
American Vacuum Society
发表日期
2009-12-04
DOI
10.1116/1.3268620

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