Growth and interface of HfO2 films on H-terminated Si from a TDMAH and H2O atomic layer deposition process

标题
Growth and interface of HfO2 films on H-terminated Si from a TDMAH and H2O atomic layer deposition process
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 5, Pages 1235-1240
出版商
American Vacuum Society
发表日期
2008-09-13
DOI
10.1116/1.2965813

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