SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs

Published 2010 View Full Article

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Title
SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs
Authors
Keywords
-
Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 2, Pages H182
Publisher
The Electrochemical Society
Online
2010-01-01
DOI
10.1149/1.3267039

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