Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 121, Issue 2, Pages 443-449Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00339-015-9073-8
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Funding
- Defense Advanced Research Projects Agency (DARPA) of the United States Department of Defense
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In this review, we describe the use of nanoimprint lithography in our group to fabricate plasmonic platforms with nanometer-scale critical features that would be significantly more expensive using other fabrication techniques: 3-D cones that have tips with a sub-10 nm radius of curvature, active polygonal nanofingers with sub-2 nm spacing, and deterministic nanoparticle assemblies both on arbitrary substrates and in solution. These nanostructures were primarily designed to make surface-enhanced Raman Scattering a viable analytical technique for low-level chemical and biological contaminants, but the same fabrication methods should also be useful for other nanophotonic and nanoelectronic applications.
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