Pulsed plasma etching for semiconductor manufacturing

标题
Pulsed plasma etching for semiconductor manufacturing
作者
关键词
-
出版物
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 47, Issue 30, Pages 303001
出版商
IOP Publishing
发表日期
2014-07-01
DOI
10.1088/0022-3727/47/30/303001

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