Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics

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Title
Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 118, Issue 27, Pages 14905-14912
Publisher
American Chemical Society (ACS)
Online
2014-06-18
DOI
10.1021/jp502108b

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