Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics

标题
Photoassisted Immersion Deposition of Cu Clusters onto Porous Silicon: A Langmuir–Hill Ligand–Locus Model Applied to the Growth Kinetics
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 118, Issue 27, Pages 14905-14912
出版商
American Chemical Society (ACS)
发表日期
2014-06-18
DOI
10.1021/jp502108b

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