Spin-on silicon-nitride Films for Photo-lithography by RT Cure of Polysilazane

Title
Spin-on silicon-nitride Films for Photo-lithography by RT Cure of Polysilazane
Authors
Keywords
-
Journal
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
Volume 23, Issue 2, Pages 225-230
Publisher
Technical Association of Photopolymers, Japan
Online
2010-08-05
DOI
10.2494/photopolymer.23.225

Ask authors/readers for more resources

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started