A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs
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Title
A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs
Authors
Keywords
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Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 22, Issue 25, Pages 12553
Publisher
Royal Society of Chemistry (RSC)
Online
2012-04-26
DOI
10.1039/c2jm31504a
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