A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs
出版年份 2012 全文链接
标题
A facile in situ hydrophobic layer protected selective etching strategy for the synchronous synthesis/modification of hollow or rattle-type silica nanoconstructs
作者
关键词
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出版物
JOURNAL OF MATERIALS CHEMISTRY
Volume 22, Issue 25, Pages 12553
出版商
Royal Society of Chemistry (RSC)
发表日期
2012-04-26
DOI
10.1039/c2jm31504a
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