4.5 Article

Deep Traps in AlGaN/GaN Heterostructure Field-Effect Transistors Studied by Current-Mode Deep-Level Transient Spectroscopy: Influence of Device Location

Journal

JOURNAL OF ELECTRONIC MATERIALS
Volume 40, Issue 12, Pages 2337-2343

Publisher

SPRINGER
DOI: 10.1007/s11664-011-1787-6

Keywords

AlGaN/GaN HFETs; current deep-level transient spectroscopy (I-DLTS); deep-level traps; spatial variation

Funding

  1. AFRL's Materials & Manufacturing Directorate [FA8650-06-D-5401]

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Across-wafer variation of deep traps in AlGaN/GaN heterostructure field-effect transistors (HFETs) has been studied using current-mode deep-level transient spectroscopy (I-DLTS). It is found that applying a bias to the gate corresponding to open-channel or nearly pinched-off operation while cooling from 550 K has significant effects on the threshold voltage of the device and spectral features of I-DLTS at T

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