Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

Title
Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique
Authors
Keywords
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Journal
JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 352, Issue 2, Pages 259-264
Publisher
Elsevier BV
Online
2010-09-13
DOI
10.1016/j.jcis.2010.08.085

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