Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

标题
Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique
作者
关键词
-
出版物
JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 352, Issue 2, Pages 259-264
出版商
Elsevier BV
发表日期
2010-09-13
DOI
10.1016/j.jcis.2010.08.085

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