Kinetic Monte Carlo simulations of anisotropic Si(100) etching: Modeling the chemical origins of characteristic etch morphologies

Published 2010 View Full Article

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Title
Kinetic Monte Carlo simulations of anisotropic Si(100) etching: Modeling the chemical origins of characteristic etch morphologies
Authors
Keywords
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Journal
JOURNAL OF CHEMICAL PHYSICS
Volume 133, Issue 4, Pages 044710
Publisher
AIP Publishing
Online
2010-07-28
DOI
10.1063/1.3457159
References
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