Stability and interface quality of GeO2 films grown on Ge by atomic oxygen assisted deposition

Published 2008 View Full Article

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Title
Stability and interface quality of GeO2 films grown on Ge by atomic oxygen assisted deposition
Authors
Keywords
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Journal
JOURNAL OF CHEMICAL PHYSICS
Volume 129, Issue 1, Pages 011104
Publisher
AIP Publishing
Online
2008-07-11
DOI
10.1063/1.2955446
References
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