Effect of oxygen vacancy on the dielectric relaxation of BaTiO3 thin films in a quenched state

Erratum: “Strong room temperature magnetism in highly resistive strained thin films of BiFe0.5Mn0.5O3” [Appl. Phys. Lett. 98, 012509 (2011)]

(2011) E.-M. Choi et al.   APPLIED PHYSICS LETTERS

Measurement of oxygen diffusion in nanometer scale HfO2 gate dielectric films

(2011) Sufi Zafar et al.   APPLIED PHYSICS LETTERS

Ultra wide band frequency characterization of integrated TiTaO-based metal–insulator–metal devices

(2011) Thomas Bertaud et al.   JOURNAL OF APPLIED PHYSICS

HighKCapacitors and OFET Gate Dielectrics from Self-Assembled BaTiO3and (Ba,Sr)TiO3Nanocrystals in the Superparaelectric Limit

(2010) Limin Huang et al.   ADVANCED FUNCTIONAL MATERIALS

Extrinsic effects on dielectric response of ultrafine grain BaTiO3 ceramics

(2010) Haitao Zhang et al.   APPLIED PHYSICS LETTERS

Enhancement of the Double-Layer Capacitance in BaTiO[sub 3]:H-Based Solid Electrolyte

(2010) F. El Kamel et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Piezoelectric BaTiO3Thin Film Nanogenerator on Plastic Substrates

(2010) Kwi-Il Park et al.   NANO LETTERS

Fabrication and Electromechanical Characterization of a Piezoelectric Structural Fiber for Multifunctional Composites

(2009) Yirong Lin et al.   ADVANCED FUNCTIONAL MATERIALS

Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges

(2009) Rainer Waser et al.   ADVANCED MATERIALS

Erratum: “High-performance ZnO nanowire field effect transistors” [Appl. Phys. Lett. 89, 133113 (2006)]

(2009) Pai-Chun Chang et al.   APPLIED PHYSICS LETTERS

Proton related defects in α-BaTiO3:H films based MIM capacitors

(2009) F. El Kamel et al.   SOLID STATE IONICS

How Is Oxygen Incorporated into Oxides? A Comprehensive Kinetic Study of a Simple Solid-State Reaction with SrTiO3as a Model Material

(2008) Rotraut Merkle et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films

(2008) X. H. Zhu et al.   JOURNAL OF APPLIED PHYSICS