Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon

Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

(2010) C. Wiemer et al.   APPLIED PHYSICS LETTERS

Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process

(2010) V. K. Kamineni et al.   JOURNAL OF APPLIED PHYSICS

Cubic phase stabilization and improved dielectric properties of atomic-layer-deposited Er yHf1-yO x thin films

(2010) K.B. Jinesh et al.   JOURNAL OF MATERIALS RESEARCH

Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2

(2010) D. R. Baer et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

The formation of Er-oxide nanoclusters in SiO2 thin films with excess Si

(2009) Annett Thogersen et al.   JOURNAL OF APPLIED PHYSICS

The influence of stoichiometry on the structural stability and on the optical emission of erbium silicate thin films

(2008) R. Lo Savio et al.   APPLIED PHYSICS LETTERS

Optical properties of thermally annealed hafnium oxide and their correlation with structural change

(2008) Jun-Woo Park et al.   JOURNAL OF APPLIED PHYSICS

Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry

(2008) James N. Hilfiker et al.   THIN SOLID FILMS