Influence of AlN interlayer on the anisotropic electron mobility and the device characteristics of N-polar AlGaN/GaN metal-insulator-semiconductor-high electron mobility transistors grown on vicinal substrates

Title
Influence of AlN interlayer on the anisotropic electron mobility and the device characteristics of N-polar AlGaN/GaN metal-insulator-semiconductor-high electron mobility transistors grown on vicinal substrates
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 108, Issue 7, Pages 074502
Publisher
AIP Publishing
Online
2010-10-06
DOI
10.1063/1.3488641

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